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advanced lithography中文是什么意思

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  • Before more advanced lithography tool is produced, in order to use current tools to manufacture vdsm ic, reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase-shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry
    在波长更小的光刻系统出现前,为了能利用现有设备解决集成电路的可制造性问题,工业界提出了对掩模作预失真(光学邻近校正)和在掩模上加相位转移模(移相掩模)等的掩模校正方法。
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Last modified time:Tue, 19 Aug 2025 00:29:56 GMT

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